Appiled Materials, Inc.
4Patents
1Active
4Granted
32Portfolio score
Filing activity: Mar 10, 2000 → Oct 7, 2005 · 1 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6517414B1 | Method and apparatus for controlling a pad conditioning process of a chemical-mechanical polishing apparatus | Performing Operations; Transporting | 55 | Expired |
| US6676760B2 | Process chamber having multiple gas distributors and method | Chemistry; Metallurgy | 20 | Expired |
| US7464917B2 | Ampoule splash guard apparatus | Emerging Cross-Sectional Technologies | 16 | Active |
| US7430104B2 | Electrostatic chuck for wafer metrology and inspection equipment | Emerging Cross-Sectional Technologies | 5 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.