Multiplanar Technologies Incorporated
11Patents
0Active
11Granted
28Portfolio score
Filing activity: May 12, 2000 → Mar 27, 2003
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6506105B1 | System and method for pneumatic diaphragm CMP head having separate retaining ring and multi-region wafer pressure control | Performing Operations; Transporting | 61 | Expired |
| US6558232B1 | System and method for CMP having multi-pressure zone loading for improved edge and annular zone material removal control | Performing Operations; Transporting | 51 | Expired |
| US6623343B2 | System and method for CMP head having multi-pressure annular zone subcarrier material removal control | Performing Operations; Transporting | 28 | Expired |
| US6893327B2 | Chemical mechanical polishing apparatus and method having a retaining ring with a contoured surface | Performing Operations; Transporting | 19 | Expired |
| US6887132B2 | Slurry distributor for chemical mechanical polishing apparatus and method of using the same | Performing Operations; Transporting | 17 | Expired |
| US6540590B1 | Chemical mechanical polishing apparatus and method having a rotating retaining ring | Performing Operations; Transporting | 13 | Expired |
| US6527625B1 | Chemical mechanical polishing apparatus and method having a soft backed polishing head | Performing Operations; Transporting | 10 | Expired |
| US6508696B1 | Wafer-polishing head and polishing apparatus having the same | Performing Operations; Transporting | 8 | Expired |
| US7118456B2 | Polishing head, retaining ring for use therewith and method fo polishing a substrate | Performing Operations; Transporting | 6 | Expired |
| US6966822B2 | System and method for CMP having multi-pressure zone loading for improved edge and annular zone material removal control | Performing Operations; Transporting | 6 | Expired |
| US6641461B2 | Chemical mechanical polishing apparatus having edge, center and annular zone control of material removal | Performing Operations; Transporting | 2 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.