Antonio Mani
4Patents
2h-index
13Co-inventors
34Inventor score
Filing activity: Aug 8, 2017 → Feb 1, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10943838B2 | Measurement of overlay error using device inspection system | Electricity | 5 | Active |
| US10699926B2 | Identifying nuisances and defects of interest in defects detected on a wafer | Physics | 4 | Active |
| US11784097B2 | Measurement of overlay error using device inspection system | Electricity | 0 | Active |
| US10598617B2 | Metrology guided inspection sample shaping of optical inspection results | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.