Christoph Friedrich
5Patents
4h-index
16Co-inventors
43Inventor score
Filing activity: Oct 29, 1999 → May 30, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6631511B2 | Generating mask layout data for simulation of lithographic processes | Physics | 40 | Expired |
| US6686098B2 | Lithography method and lithography mask | Physics | 9 | Expired |
| US6660437B2 | Alternating phase mask | Physics | 8 | Expired |
| US6466373B1 | Trimming mask with semitransparent phase-shifting regions | Physics | 5 | Expired |
| US6635388B1 | Contact hole fabrication with the aid of mutually crossing sudden phase shift edges of a single phase shift mask | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.