Alternating phase mask

US6660437B2 · kind B2 · utility

Assignee

• Infineon Technologies AG · DE

Inventors

• Christoph Friedrich · Hersbruck, DE
• Uwe Griesinger · Hersbruck, DE
• Michael Heissmeier · Hersbruck, DE
• Burkhard Ludwig · Birkenfeld, DE
• Molela Moukara · Munich, DE
• Rainer Pforr · Dresden, DE

Key dates

• Filing date: May 30, 2002
• Grant date: Dec 9, 2003
• Expiry date: May 30, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F1/30
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An alternating phase mask having a branched structure containing two opaque segments is described. Two transparent surface segments are disposed on both sides of the segments or the components thereof, respectively. The surface segments are provided with phases that are displaced by 180°±&Dgr; &agr;, whereby &Dgr; &agr; a is not more than 25°. The surface segments are separated by at least one transparent surface boundary segment whose phase is situated between the phases of the adjacent surface segments.