Christopher Campbell
9Patents
4h-index
22Co-inventors
53Inventor score
Filing activity: Sep 27, 2005 → Sep 6, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7391333B2 | System for monitoring quality of water system | Physics | 26 | Expired |
| US9706634B2 | Apparatus and techniques to treat substrates using directional plasma and reactive gas | Electricity | 10 | Active |
| US8809800B2 | Ion source and a method for in-situ cleaning thereof | Electricity | 8 | Active |
| US10004133B2 | Apparatus and techniques to treat substrates using directional plasma and reactive gas | Electricity | 4 | Active |
| US9142379B2 | Ion source and a method for in-situ cleaning thereof | Electricity | 4 | Active |
| US10128082B2 | Apparatus and techniques to treat substrates using directional plasma and point of use chemistry | Electricity | 1 | Active |
| US10276340B1 | Low particle capacitively coupled components for workpiece processing | Electricity | 1 | Active |
| US10730082B2 | Apparatus and method for differential in situ cleaning | Electricity | 0 | Active |
| US10600616B2 | Apparatus and techniques to treat substrates using directional plasma and point of use chemistry | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.