Method of achieving CD linearity control for full-chip CPL manufacturing
US7211815B2 · kind B2 · utility
1Cited by
23References
21Claims
0Family size
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Key dates
| Filing date | Sep 11, 2003 |
| Grant date | May 1, 2007 |
| Priority date | — |
| Expiry date | Mar 9, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/34
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of generating masks for printing a pattern including a plurality of features having varying critical dimensions. The method includes the steps of: (1) obtaining data representing the pattern; (2) defining a plurality of distinct zones based on the critical dimensions of the plurality of features; (3) categorizing each of the features into one of the plurality of distinct zones; and (4) modifying the mask pattern for each feature categorized into a predefined distinct zone of the plurality of distinct zones.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.