Craig E. Schneider
14Patents
5h-index
21Co-inventors
66Inventor score
Filing activity: Mar 15, 1996 → Dec 11, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5627785A | Memory device with a sense amplifier | Physics | 107 | Expired |
| US6922600B1 | System and method for optimizing manufacturing processes using real time partitioned process capability analysis | Emerging Cross-Sectional Technologies | 13 | Expired |
| US5744978A | Variable load device responsive to a circuit parameter | Physics | 5 | Expired |
| US6557163B1 | Method of photolithographic critical dimension control by using reticle measurements in a control algorithm | Physics | 5 | Expired |
| US6965808B1 | System and method for optimizing metrology sampling in APC applications | Physics | 5 | Expired |
| US5901099A | Memory device with a sense amplifier | Physics | 3 | Expired |
| US6058058A | Memory device with a sense amplifier | Physics | 3 | Expired |
| US5812470A | Apparatus, system and method for identifying semiconductor memory access modes | Physics | 3 | Expired |
| US6674516B2 | Method of photolithographic exposure dose control as a function of resist sensitivity | Physics | 2 | Expired |
| US6172924A | Memory device with a sense amplifier | Physics | 2 | Expired |
| US5940338A | Memory device with a sense amplifier | Physics | 1 | Expired |
| US9330988B1 | Method of fine-tuning process controls during integrated circuit chip manufacturing based on substrate backside roughness | Electricity | 0 | Active |
| US9576863B2 | Method of fine-tuning process controls during integrated circuit chip manufacturing based on substrate backside roughness | Electricity | 0 | Active |
| US6856378B2 | Method of photolithographic exposure dose control as a function of resist sensitivity | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.