Curt Dundas
13Patents
8h-index
14Co-inventors
61Inventor score
Filing activity: Aug 31, 1999 → Dec 2, 2005
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6508920B1 | Apparatus for low-temperature annealing of metallization microstructures in the production of a microelectronic device | Electricity | 41 | Expired |
| US6423642B1 | Reactor for processing a semiconductor wafer | Emerging Cross-Sectional Technologies | 33 | Expired |
| US6413436B1 | Selective treatment of the surface of a microelectronic workpiece | Emerging Cross-Sectional Technologies | 29 | Expired |
| US6632292B1 | Selective treatment of microelectronic workpiece surfaces | Emerging Cross-Sectional Technologies | 26 | Expired |
| US7399713B2 | Selective treatment of microelectric workpiece surfaces | Emerging Cross-Sectional Technologies | 18 | Expired |
| US7102763B2 | Methods and apparatus for processing microelectronic workpieces using metrology | Electricity | 15 | Expired |
| US7429537B2 | Methods and apparatus for rinsing and drying | Electricity | 10 | Expired |
| US6794291B2 | Reactor for processing a semiconductor wafer | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6692613B2 | Reactor for processing a semiconductor wafer | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6447633B1 | Reactor for processing a semiconductor wafer | Emerging Cross-Sectional Technologies | 7 | Expired |
| US7462269B2 | Method for low temperature annealing of metallization micro-structures in the production of a microelectronic device | Electricity | 5 | Expired |
| US6994776B2 | Method and apparatus for low temperature annealing of metallization micro-structure in the production of a microelectronic device | Electricity | 2 | Expired |
| US7001471B2 | Method and apparatus for low-temperature annealing of metallization microstructures in the production of a microelectronic device | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.