Daniel C. Baker
11Patents
6h-index
7Co-inventors
51Inventor score
Filing activity: Aug 28, 1997 → Nov 16, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5952241A | Method and apparatus for improving alignment for metal masking in conjuction with oxide and tungsten CMP | Electricity | 13 | Expired |
| US5952135A | Method for alignment using multiple wavelengths of light | Physics | 12 | Expired |
| US5852497A | Method and apparatus for detecting edges under an opaque layer | Physics | 11 | Expired |
| US6818064B2 | Photoresist dispense arrangement by compensation for substrate reflectivity | Electricity | 8 | Expired |
| US6313542A | Method and apparatus for detecting edges under an opaque layer | Physics | 7 | Expired |
| US6411367B1 | Modified optics for imaging of lens limited subresolution features | Physics | 7 | Expired |
| US6262795A | Apparatus and method for the improvement of illumination uniformity in photolithographic systems | Physics | 6 | Expired |
| US6162586A | Method for substantially preventing footings in chemically amplified deep ultra violet photoresist layers | Electricity | 6 | Expired |
| US6274940A | Semiconductor wafer, a chemical-mechanical alignment mark, and an apparatus for improving alignment for metal masking in conjunction with oxide and tungsten CMP | Electricity | 5 | Expired |
| US6433854B1 | Method of illumination uniformity in photolithographic systems | Physics | 4 | Expired |
| US6319735A | Photoresist dispense method by compensation for substrate reflectivity | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.