Inventor · Newark, DE, US

David Shidner

7Patents
6h-index
12Co-inventors
56Inventor score

Filing activity: Sep 28, 1999 → May 1, 2017

Most-cited inventions

PatentTitleAreaCited byStatus
US6454634B1 Polishing pads for chemical mechanical planarization Performing Operations; Transporting 75 Expired
US6749485B1 Hydrolytically stable grooved polishing pads for chemical mechanical planarization Emerging Cross-Sectional Technologies 72 Expired
US6736709B1 Grooved polishing pads for chemical mechanical planarization Performing Operations; Transporting 57 Expired
US6860802B1 Polishing pads for chemical mechanical planarization Performing Operations; Transporting 55 Expired
US6582283B2 Polishing pads for chemical mechanical planarization Performing Operations; Transporting 50 Expired
US6361409B1 Polymeric polishing pad having improved surface layer and method of making same Performing Operations; Transporting 11 Expired
US11524390B2 Methods of making chemical mechanical polishing layers having improved uniformity Performing Operations; Transporting 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.