David Tien
9Patents
3h-index
10Co-inventors
50Inventor score
Filing activity: May 12, 2003 → Aug 10, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9709903B2 | Overlay target geometry for measuring multiple pitches | Physics | 12 | Active |
| US10295993B2 | Method and system for detecting and correcting problematic advanced process control parameters | Emerging Cross-Sectional Technologies | 8 | Active |
| US8655469B2 | Advanced process control optimization | Physics | 3 | Active |
| US10095121B2 | Optimizing the utilization of metrology tools | Physics | 3 | Active |
| US9476838B2 | Hybrid imaging and scatterometry targets | Physics | 2 | Active |
| US9466100B2 | Focus monitoring method using asymmetry embedded imaging target | Physics | 1 | Active |
| US6978535B2 | Pressing device for thin-film circuit and terminal | Emerging Cross-Sectional Technologies | 1 | Expired |
| US10725385B2 | Optimizing the utilization of metrology tools | Physics | 0 | Active |
| US9291920B2 | Focus recipe determination for a lithographic scanner | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.