Don Eisenhour
8Patents
4h-index
7Co-inventors
42Inventor score
Filing activity: Mar 18, 1998 → Jun 5, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6050509A | Method of manufacturing polymer-grade clay for use in nanocomposites | Chemistry; Metallurgy | 36 | Expired |
| US6090734A | Process for purifying clay by the hydrothermal conversion of silica impurities to a dioctahedral or trioctahedral smectite clay | Chemistry; Metallurgy | 18 | Expired |
| US7112123B2 | Chemical-mechanical polishing (CMP) slurry containing clay and CeO2 abrasive particles and method of planarizing surfaces | Electricity | 14 | Expired |
| US6235533A | Method of determining the composition of clay deposit | Physics | 6 | Expired |
| US7087529B2 | Chemical-mechanical polishing (CMP) slurry and method of planarizing surfaces | Electricity | 4 | Expired |
| US7267784B2 | Chemical-mechanical polishing (CMP) slurry and method of planarizing computer memory disk surfaces | Electricity | 2 | Active |
| US6860319B2 | Acid activated clay for use in foundry sand | Performing Operations; Transporting | 0 | Expired |
| US7223156B2 | Method chemical-mechanical polishing and planarizing corundum, GaAs, GaP and GaAs/GaP alloy surfaces | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.