Douglas Broeke
5Patents
4h-index
7Co-inventors
39Inventor score
Filing activity: Jan 14, 2004 → Mar 6, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7247574B2 | Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography | Physics | 32 | Expired |
| US7506299B2 | Feature optimization using interference mapping lithography | Physics | 24 | Active |
| US7594199B2 | Method of optical proximity correction design for contact hole mask | Physics | 13 | Expired |
| US7774736B2 | Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography | Physics | 6 | Active |
| US7399559B2 | Optical proximity correction method utilizing phase-edges as sub-resolution assist features | Physics | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.