Optical metrology utilizing short-wave infrared wavelengths
US12111580B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 29, 2021 |
| Grant date | Oct 8, 2024 |
| Priority date | — |
| Expiry date | May 18, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70683
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical metrology tool may include one or more illumination sources to generate illumination having wavelengths both within a short-wave infrared (SWIR) spectral range and outside the SWIR spectral range, illumination optics configured to direct the illumination to a sample, a first imaging channel including a first detector configured to image the sample based on a first wavelength range including at least some wavelengths in the SWIR spectral range, a second imaging channel including a second detector configured to image the sample based on a second wavelength range including at least some wavelengths outside the SWIR spectral range, and a controller. The controller may receive first images of the sample from the first detector, receive second images of the sample from the second detector, and generate an optical metrology measurement of the sample based on the first and second images.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.