Eunhee Jeang
7Patents
1h-index
34Co-inventors
40Inventor score
Filing activity: Sep 15, 2020 → Jan 18, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11955387B2 | Method of fabricating a semiconductor device | Electricity | 1 | Active |
| US12298671B2 | Illumination correction apparatus | Electricity | 0 | Active |
| US11715628B2 | Method of forming plasma processing apparatus, related apparatus, and method of forming semiconductor device using the same | Electricity | 0 | Active |
| US11823961B2 | Substrate inspection system and method of manufacturing semiconductor device using substrate inspection system | Electricity | 0 | Active |
| US11946809B2 | Polarization measuring device and method of fabricating semiconductor device using the same | Electricity | 0 | Active |
| US11996270B2 | Wafer processing apparatus | Electricity | 0 | Active |
| US12224214B2 | Method of fabricating a semiconductor device | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.