Gijsbert Rispens
7Patents
2h-index
36Co-inventors
43Inventor score
Filing activity: Dec 1, 2015 → Jul 30, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11079687B2 | Process window based on defect probability | Physics | 7 | Active |
| US10416555B2 | Lithographic patterning process and resists to use therein | Physics | 2 | Active |
| US10948825B2 | Method for removing photosensitive material on a substrate | Physics | 1 | Active |
| US10908496B2 | Membrane for EUV lithography | Physics | 1 | Active |
| US11415886B2 | Lithographic patterning process and resists to use therein | Physics | 0 | Active |
| US11822255B2 | Process window based on defect probability | Physics | 0 | Active |
| US11762281B2 | Membrane for EUV lithography | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.