Inventor · Fremont, CA, US

Gregory Sexton

19Patents
6h-index
11Co-inventors
59Inventor score

Filing activity: Jan 26, 2007 → Jan 29, 2021

Most-cited inventions

PatentTitleAreaCited byStatus
US9881788B2 Back side deposition apparatus and applications Electricity 351 Active
US7858898B2 Bevel etcher with gap control Electricity 321 Active
US7943007B2 Configurable bevel etcher Electricity 18 Active
US8580078B2 Bevel etcher with vacuum chuck Electricity 16 Active
US8721908B2 Bevel etcher with vacuum chuck Electricity 9 Active
US7938931B2 Edge electrodes with variable power Electricity 7 Active
US8562266B2 Flush mounted fastener for plasma processing apparatus Emerging Cross-Sectional Technologies 4 Active
US7662254B2 Methods of and apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a wafer Electricity 4 Active
US9053925B2 Configurable bevel etcher Electricity 3 Active
US9184043B2 Edge electrodes with dielectric covers Electricity 2 Active
US7922866B2 Apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a wafer Electricity 2 Active
US9564308B2 Methods for processing bevel edge etching Electricity 2 Active
US11756771B2 Tunable upper plasma-exclusion-zone ring for a bevel etcher Emerging Cross-Sectional Technologies 1 Active
US8252140B2 Plasma chamber for wafer bevel edge processing Electricity 1 Active
US8574397B2 Bevel edge plasma chamber with top and bottom edge electrodes Electricity 1 Active
US10937634B2 Tunable upper plasma-exclusion-zone ring for a bevel etcher Emerging Cross-Sectional Technologies 1 Active
US12387915B2 Lower plasma exclusion zone ring for bevel etcher Electricity 0 Active
US7575638B2 Apparatus for defining regions of process exclusion and process performance in a process chamber Electricity 0 Active
US8398875B2 Method of orienting an upper electrode relative to a lower electrode for bevel edge processing Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.