Hitomi Sato
16Patents
4h-index
27Co-inventors
60Inventor score
Filing activity: Mar 17, 2000 → Apr 12, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6904163B1 | Tomographic image reading method, automatic alignment method, apparatus and computer readable medium | Physics | 54 | Expired |
| US9382611B2 | Sputtering target, method for manufacturing sputtering target, and method for forming thin film | Chemistry; Metallurgy | 15 | Active |
| US8889477B2 | Method for forming thin film utilizing sputtering target | Chemistry; Metallurgy | 13 | Active |
| US8748889B2 | Semiconductor device and method of manufacturing the same | Electricity | 7 | Active |
| US7519942B2 | Pattern specification method and pattern specification apparatus | Physics | 2 | Active |
| US10527733B2 | Position information common management system for mobile object | Physics | 2 | Active |
| US9666720B2 | Semiconductor device and method of manufacturing the same | Electricity | 1 | Active |
| US8841664B2 | Semiconductor device | Electricity | 1 | Active |
| US9202822B2 | Semiconductor device and manufacturing method thereof | Electricity | 1 | Active |
| US10889888B2 | Sputtering target, method for manufacturing sputtering target, and method for forming thin film | Chemistry; Metallurgy | 0 | Active |
| US11066739B2 | Sputtering target, method for manufacturing sputtering target, and method for forming thin film | Chemistry; Metallurgy | 0 | Active |
| US11959165B2 | Semiconductor device comprising oxide semiconductor film | Chemistry; Metallurgy | 0 | Active |
| US10522689B2 | Semiconductor device and method of manufacturing the same | Electricity | 0 | Active |
| US12252775B2 | Sputtering target, method for manufacturing sputtering target, and method for forming thin film | Chemistry; Metallurgy | 0 | Active |
| US12236532B2 | Control for using information processing apparatus in virtual space | Physics | 0 | Active |
| US9812544B2 | Semiconductor device and manufacturing method thereof | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.