Jaime D. Morillo
9Patents
6h-index
5Co-inventors
52Inventor score
Filing activity: Nov 19, 2003 → Dec 9, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7626702B2 | Overlay target and measurement method using reference and sub-grids | Physics | 47 | Active |
| US6937337B2 | Overlay target and measurement method using reference and sub-grids | Physics | 36 | Expired |
| US7474401B2 | Multi-layer alignment and overlay target and measurement method | Physics | 24 | Active |
| US7359054B2 | Overlay target and measurement method using reference and sub-grids | Physics | 8 | Expired |
| US8339605B2 | Multilayer alignment and overlay target and measurement method | Physics | 7 | Active |
| US8107079B2 | Multi layer alignment and overlay target and measurement method | Physics | 6 | Active |
| US9097989B2 | Target and method for mask-to-wafer CD, pattern placement and overlay measurement and control | Physics | 5 | Active |
| US7876439B2 | Multi layer alignment and overlay target and measurement method | Physics | 4 | Active |
| US9087740B2 | Fabrication of lithographic image fields using a proximity stitch metrology | Physics | 4 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.