Jeff Tsai
4Patents
1h-index
10Co-inventors
41Inventor score
Filing activity: Apr 28, 1997 → Jan 22, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9737971B2 | Chemical mechanical polishing pad, polishing layer analyzer and method | Performing Operations; Transporting | 2 | Active |
| US5886113A | Process for preparing an elastomeric copolymer composition of mono-vinyl aromatic hydrocarbons and conjugated dienes | Chemistry; Metallurgy | 1 | Expired |
| US10272541B2 | Polishing layer analyzer and method | Electricity | 0 | Active |
| US9770808B2 | Method of manufacturing chemical mechanical polishing pads | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.