Jeffrey Mackey
14Patents
6h-index
14Co-inventors
59Inventor score
Filing activity: Oct 14, 2003 → Jan 6, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7538858B2 | Photolithographic systems and methods for producing sub-diffraction-limited features | Physics | 39 | Active |
| US7046339B2 | Optimized optical lithography illumination source for use during the manufacture of a semiconductor device | Physics | 27 | Expired |
| US9202833B2 | Imaging systems with baffle grids | Electricity | 18 | Active |
| US6894765B2 | Methods and systems for controlling radiation beam characteristics for microlithographic processing | Physics | 10 | Expired |
| US7283205B2 | Optimized optical lithography illumination source for use during the manufacture of a semiconductor device | Physics | 7 | Expired |
| US7053987B2 | Methods and systems for controlling radiation beam characteristics for microlithographic processing | Physics | 6 | Expired |
| US7130022B2 | Methods and systems for controlling radiation beam characteristics for microlithographic processing | Physics | 4 | Expired |
| US9093579B2 | Dielectric barriers for pixel arrays | Electricity | 2 | Active |
| US9179110B2 | Imaging systems with modified clear image pixels | Electricity | 2 | Active |
| US9338413B2 | Imaging systems with image pixels having adjustable spectral responses | Electricity | 1 | Active |
| US9172892B2 | Imaging systems with image pixels having varying light collecting areas | Electricity | 1 | Active |
| US7823440B2 | Systems and methods for characterizing thickness and topography of microelectronic workpiece layers | Physics | 0 | Active |
| US12189117B2 | Self-cleaning camera lens system and method | Electricity | 0 | Active |
| US7760329B2 | Optimized optical lithography illumination source for use during the manufacture of a semiconductor device | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.