Jens Stäcker
7Patents
2h-index
10Co-inventors
44Inventor score
Filing activity: Jun 19, 2003 → Mar 18, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6861331B2 | Method for aligning and exposing a semiconductor wafer | Emerging Cross-Sectional Technologies | 6 | Expired |
| US7268877B2 | Method and apparatus for orienting semiconductor wafers in semiconductor fabrication | Physics | 2 | Expired |
| US7310129B2 | Method for carrying out a double or multiple exposure | Physics | 2 | Expired |
| US10627729B2 | Calibration method for a lithographic apparatus | Physics | 2 | Active |
| US7186484B2 | Method for determining the relative positional accuracy of two structure elements on a wafer | Electricity | 1 | Expired |
| US10884345B2 | Calibration method for a lithographic apparatus | Physics | 0 | Active |
| US6896999B2 | Method of exposing a semiconductor wafer in an exposer | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.