Patent · US Expired

Method for carrying out a double or multiple exposure

US7310129B2 · kind B2 · utility

2Cited by

8References

14Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Jens Stäcker · Eindhoven, NL
Heiko Hommen · Dresden, DE
Jens Uwe Bruch · Dresden, DE
Marlene Strobl · Shilin, TW
Karl-Heinz Schumacher · Ludwigshafen, DE

Key dates

Filing date	Sep 24, 2004
Grant date	Dec 18, 2007
Priority date	—
Expiry date	Apr 19, 2025

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70733
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The mutually associated structure patterns, which are provided on one mask, or a plurality of masks for a double or multiple exposure can be received by the mask substrate holder. The mask substrate holder has two receiving stations one for each of the masks. Alternatively, both structure patterns for the double exposure are formed on one mask. The substrate holder has one receiving station. The substrate holder, is displaced from the section including first structure pattern to the second, between the two exposure operations, without the masks having to be loaded or unloaded, and realigned.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.