John K. Dorey, II
3Patents
3h-index
7Co-inventors
39Inventor score
Filing activity: Apr 16, 1984 → Aug 6, 1990
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5066615A | Photolithographic processes using thin coatings of refractory metal silicon nitrides as antireflection layers | Emerging Cross-Sectional Technologies | 75 | Expired |
| US4574031A | Additive processing electroless metal plating using aqueous photoresist | Electricity | 20 | Expired |
| US4537799A | Selective metallization process | Electricity | 10 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.