Jonathan Lachance
4Patents
2h-index
4Co-inventors
33Inventor score
Filing activity: May 31, 2001 → Nov 17, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6749893B2 | Method of preventing cracking in optical quality silica layers | Physics | 6 | Expired |
| US7614253B2 | Method of reducing stress-induced mechanical problems in optical components | Physics | 4 | Active |
| US6716476B2 | Method of depositing an optical quality silica film by PECVD | Physics | 1 | Expired |
| US6887514B2 | Method of depositing optical films | Chemistry; Metallurgy | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.