Jorg Thiele
7Patents
3h-index
15Co-inventors
46Inventor score
Filing activity: Sep 28, 1999 → Aug 27, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6745380B2 | Method for optimizing and method for producing a layout for a mask, preferably for use in semiconductor production, and computer program therefor | Physics | 181 | Expired |
| US6493865B2 | Method of producing masks for fabricating semiconductor structures | Physics | 3 | Expired |
| US6692875B2 | Mask for optical projection systems, and a process for its production | Physics | 3 | Expired |
| US7393613B2 | Set of at least two masks for the projection of structure patterns | Physics | 2 | Expired |
| US7393614B2 | Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer | Physics | 1 | Expired |
| US6562664B1 | Method for installing protective components in integrated circuits that are constructed from standard cells | Electricity | 0 | Expired |
| US7354683B2 | Lithography mask for imaging of convex structures | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.