Lithography mask for imaging of convex structures

US7354683B2 · kind B2 · utility

Assignee

• Infineon Technologies AG · DE

Inventors

• Molela Moukara · Munich, DE
• Burkhard Ludwig · Birkenfeld, DE
• Jorg Thiele · Birkenfeld, DE
• Marco Ahrens · Hohenlinden, DE
• Roderick Köhle · Munich, DE
• Rainer Pforr · Dresden, DE
• Nicolo Morgana · Dresden, DE

Key dates

• Filing date: Aug 27, 2004
• Grant date: Apr 8, 2008
• Expiry date: Sep 16, 2026

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70466
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A lithography mask has an angled structure element (O) formed by a first opaque segment (O1) and by a second opaque segment (O2). The structure element has at least one reflex angle (α). The angled structure element (O) includes at least one convex section (A) facing the reflex angle (α). At least one transparent structure (T) adjacent to the angled structure element (O) is provided at the convex section (A) of the angled structure element (O). The transparent structure (T) is formed in separated fashion at the convex section (A) of the angled structure element (O) and thus comprises two distinguishable transparent segments (T1, T2) formed at least in sections essentially axially symmetrically with respect to the angle bisector (WH) of the reflex angle.