Patent · US Expired

Set of at least two masks for the projection of structure patterns

US7393613B2 · kind B2 · utility

2Cited by

5References

5Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Wolfgang Dettmann · Schliersee, DE
Jorg Thiele · Birkenfeld, DE
Rainer Pforr · Dresden, DE
Mario Hennig · Dresden, DE
Karsten Zeiler · Birkenfeld, DE

Key dates

Filing date	Mar 4, 2004
Grant date	Jul 1, 2008
Priority date	—
Expiry date	Apr 3, 2025

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70466
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A set of at least two masks, coordinated with one another, for the projection of structure patterns, into the same photosensitive layer arranged on a semiconductor wafer. The first mask includes a semitransparent or nontransparent first layer, which is arranged on a first substrate and in which at least one first opening is formed at a first position, the first opening having a first lateral dimension, which is greater than the resolution limit of a projection system for the projection of the structure patterns. The second mask includes a semitransparent or nontransparent second layer, which is arranged on a second substrate and in which at least one dummy structure assigned to the first opening is formed at a second position, the dummy structure having a second lateral dimension, which is smaller than the resolution limit of the projection system wherein the first position on the first mask corresponds to the second position on the second mask.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.