Kenneth Weible
4Patents
1h-index
13Co-inventors
37Inventor score
Filing activity: Aug 12, 2008 → Nov 19, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8395756B2 | Illumination system for a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US9217930B2 | Illumination system for a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US9025131B2 | Optical beam deflecting element, illumination system including same, and related method | Physics | 0 | Active |
| US9575414B2 | Illumination system for a microlithographic projection exposure apparatus | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.