Illumination system for a microlithographic projection exposure apparatus

US9217930B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Johannes Wangler · Oberkochen, DE
• Heiko Siekmann · Aalen, DE
• Kenneth Weible · Moutier, CH
• Ralf Scharnweber · Aalen, DE
• Manfred Maul · Aalen, DE
• Markus Deguenther · Aalen, DE
• Michael Layh · Altusried, DE
• Axel Scholz · Aalen, DE
• Uwe Spengler · Treuchtlingen, DE
• Reinhard Voelkel · Neuchâtel, CH

Key dates

• Filing date: Feb 6, 2013
• Grant date: Dec 22, 2015
• Expiry date: Feb 6, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70158
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.