Illumination system for a microlithographic projection exposure apparatus

US8395756B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Johannes Wangler · Oberkochen, DE
• Heiko Siekmann · Aalen, DE
• Kenneth Weible · Moutier, CH
• Ralf Scharnweber · Aalen, DE
• Manfred Maul · Aalen, DE
• Markus Deguenther · Aalen, DE
• Michael Layh · Altusried, DE
• Axel Scholz · Aalen, DE
• Uwe Spengler · Treuchtlingen, DE
• Reinhard Voelkel · Neuchâtel, CH

Key dates

• Filing date: Aug 12, 2008
• Grant date: Mar 12, 2013
• Expiry date: May 25, 2030

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70158
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.