Inventor · Orchard Park, NY, US

Mark K. Weise

12Patents
7h-index
17Co-inventors
63Inventor score

Filing activity: May 30, 1989 → Jun 8, 2021

Most-cited inventions

PatentTitleAreaCited byStatus
US6106678A Method of high density plasma CVD gap-filling Electricity 565 Expired
US4900480A Gas-liquid mixing Performing Operations; Transporting 80 Expired
US5750211A Process for depositing a SiO.sub.x film having reduced intrinsic stress and/or reduced hydrogen content Chemistry; Metallurgy 64 Expired
US5009816A Broad liquid level gas-liquid mixing operations Performing Operations; Transporting 51 Expired
US6326064A Process for depositing a SiOx film having reduced intrinsic stress and/or reduced hydrogen content Chemistry; Metallurgy 22 Expired
US7704921B2 Production of activated char using hot gas Chemistry; Metallurgy 13 Active
US5004571A Liquid level control in gas-liquid mixing operations Performing Operations; Transporting 12 Expired
US8124561B2 Production of activated char using hot gas Chemistry; Metallurgy 3 Active
US7772128B2 Semiconductor system with surface modification Electricity 1 Active
US10081761B2 Process for making and supplying a high quality fracturing fluid Chemistry; Metallurgy 0 Active
US11897030B2 Method and system for improved temperature control for additive manufacturing Emerging Cross-Sectional Technologies 0 Active
US10829683B2 Process for making and supplying a high quality fracturing fluid Chemistry; Metallurgy 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.