Estimating shape based on comparison between actual waveform and library in lithography process
US8671366B2 · kind B2 · utility
3Cited by
4References
4Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 15, 2010 |
| Grant date | Mar 11, 2014 |
| Priority date | — |
| Expiry date | Jul 15, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention aims at proposing a library creation method and a pattern shape estimation method in which it is possible, when estimating a shape based on comparison between an actual waveform and a library, to appropriately estimate the shape.As an illustrative embodiment to achieve the object, there are proposed a method of selecting a pattern by referring to a library, a method of creating a library by use of pattern cross-sectional shapes calculated through an exposure process simulation in advance, and a method for selecting a pattern shape stored in the library.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.