Michael Kubis
33Patents
6h-index
70Co-inventors
72Inventor score
Filing activity: Jul 14, 2000 → Jul 26, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9081303B2 | Methods and scatterometers, lithographic systems, and lithographic processing cells | Physics | 70 | Active |
| US9140998B2 | Metrology method and inspection apparatus, lithographic system and device manufacturing method | Physics | 19 | Active |
| US8976355B2 | Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods | Physics | 19 | Active |
| US8994944B2 | Methods and scatterometers, lithographic systems, and lithographic processing cells | Physics | 14 | Active |
| US8908147B2 | Method and apparatus for determining an overlay error | Physics | 8 | Active |
| US9946167B2 | Metrology method and inspection apparatus, lithographic system and device manufacturing method | Physics | 8 | Active |
| US9069264B2 | Metrology method and apparatus, and device manufacturing method | Physics | 6 | Active |
| US7520746B1 | Annealing furnace cooling and purging system and method | Mechanical Engineering; Lighting; Heating | 6 | Active |
| US9158194B2 | Metrology method and apparatus, and device manufacturing method | Physics | 5 | Active |
| US10718604B2 | Metrology method, target and substrate | Physics | 5 | Active |
| US10386176B2 | Metrology method, target and substrate | Physics | 4 | Active |
| US11204239B2 | Metrology method, target and substrate | Physics | 4 | Active |
| US9291916B2 | Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods | Physics | 3 | Active |
| US7371296B1 | Annealing furnace cooling and purging system and method | Chemistry; Metallurgy | 3 | Expired |
| US6352597B1 | Method for producing a magnetic alloy powder | Performing Operations; Transporting | 3 | Expired |
| US8709687B2 | Substrate and patterning device for use in metrology, metrology method and device manufacturing method | Electricity | 3 | Active |
| US11428521B2 | Metrology method, target and substrate | Physics | 2 | Active |
| US9454084B2 | Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement system | Physics | 2 | Active |
| US8887107B2 | Inspection method and apparatus and lithographic processing cell | Physics | 2 | Active |
| US7252913B2 | Method for projection of a circuit pattern, which is arranged on a mask, onto a semiconductor wafer | Physics | 2 | Expired |
| US7435375B1 | Annealing furnace purging and oxidation system and method | Chemistry; Metallurgy | 1 | Active |
| US11385553B2 | Metrology method, patterning device, apparatus and computer program | Physics | 1 | Active |
| US10996570B2 | Metrology method, patterning device, apparatus and computer program | Physics | 1 | Active |
| US12429328B2 | Metrology method, target and substrate | Physics | 0 | Active |
| US7361238B1 | Annealing furnace purging and oxidation system and method | Chemistry; Metallurgy | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.