Ming-Yeon Hung
3Patents
3h-index
9Co-inventors
43Inventor score
Filing activity: Sep 9, 1996 → Mar 3, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6069091A | In-situ sequential silicon containing hard mask layer/silicon layer plasma etch method | Electricity | 38 | Expired |
| US8229588B2 | Method and system for tuning advanced process control parameters | Physics | 25 | Active |
| US5770523A | Method for removal of photoresist residue after dry metal etch | Emerging Cross-Sectional Technologies | 24 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.