Natsuyo Morioka
6Patents
4h-index
20Co-inventors
49Inventor score
Filing activity: Sep 3, 1999 → Aug 9, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6611728B1 | Inspection system and method for manufacturing electronic devices using the inspection system | Electricity | 32 | Expired |
| US6733618B2 | Disturbance-free, recipe-controlled plasma processing system and method | Emerging Cross-Sectional Technologies | 9 | Expired |
| US7601240B2 | Disturbance-free, recipe-controlled plasma processing system and method | Emerging Cross-Sectional Technologies | 6 | Active |
| US6881352B2 | Disturbance-free, recipe-controlled plasma processing method | Emerging Cross-Sectional Technologies | 6 | Expired |
| US7945410B2 | Semiconductor device yield prediction system and method | Physics | 4 | Active |
| US6916396B2 | Etching system and etching method | Physics | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.