Etching system and etching method
US6916396B2 · kind B2 · utility
1Cited by
7References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 21, 2002 |
| Grant date | Jul 12, 2005 |
| Priority date | — |
| Expiry date | Oct 27, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/45212
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An etching system for subjecting a single film to be etched to etching involves a plurality of etching steps in which respective different recipes are applied. The etching system employs recipe generating means which fixes the recipe to be applied to the final etching step, affecting an underlying film making contact with the film to be etched, of the etching steps, to a preset recipe, and which generates a recipe to be applied to the residual etching step on the basis of the results of processing. Etching processing is conducted according to the recipes generated by the recipe generating means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.