Nicholas Webb
6Patents
4h-index
7Co-inventors
46Inventor score
Filing activity: Sep 20, 2002 → Oct 22, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6846726B2 | Silicon parts having reduced metallic impurity concentration for plasma reaction chambers | Electricity | 9 | Expired |
| US10748748B2 | RF impedance model based fault detection | Electricity | 6 | Active |
| US10128090B2 | RF impedance model based fault detection | Electricity | 6 | Active |
| US7517803B2 | Silicon parts having reduced metallic impurity concentration for plasma reaction chambers | Electricity | 5 | Expired |
| US8492174B2 | Etch tool process indicator method and apparatus | Electricity | 1 | Active |
| US8206996B2 | Etch tool process indicator method and apparatus | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.