Otto Koblinger
4Patents
4h-index
5Co-inventors
39Inventor score
Filing activity: Mar 21, 1989 → Sep 9, 1996
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5109267A | Method for producing an integrated circuit structure with a dense multilayer metallization pattern | Electricity | 46 | Expired |
| US5055383A | Process for making masks with structures in the submicron range | Electricity | 20 | Expired |
| US4980317A | Method of producing integrated semiconductor structures comprising field-effect transistors with channel lengths in the submicron range using a three-layer resist system | Emerging Cross-Sectional Technologies | 17 | Expired |
| US5966633A | Method for providing a metallization layer on an insulating layer and for opening through holes in the said insulating layer using the same mask | Emerging Cross-Sectional Technologies | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.