Peter Frach
5Patents
3h-index
15Co-inventors
54Inventor score
Filing activity: Aug 11, 1997 → Sep 6, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6063245A | Magnetron sputtering method and apparatus utilizing a pulsed energy pattern | Chemistry; Metallurgy | 37 | Expired |
| US6005218A | Process and circuit for the bipolar pulse-shaped feeding of energy into low-pressure plasmas | Electricity | 29 | Expired |
| US6132563A | Reactive sputtering process | Chemistry; Metallurgy | 18 | Expired |
| US9994950B2 | Method for depositing a piezoelectric film containing AIN, and a piezoelectric film containing AIN | Electricity | 0 | Active |
| US10407767B2 | Method for depositing a layer using a magnetron sputtering device | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.