Prabhakara Gopaladasu
6Patents
2h-index
17Co-inventors
44Inventor score
Filing activity: May 24, 2007 → Jul 25, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8283255B2 | In-situ photoresist strip during plasma etching of active hard mask | Electricity | 3 | Active |
| US10037890B2 | Method for selectively etching with reduced aspect ratio dependence | Electricity | 2 | Active |
| US10361091B2 | Porous low-k dielectric etch | Electricity | 1 | Active |
| US10002773B2 | Method for selectively etching silicon oxide with respect to an organic mask | Electricity | 0 | Active |
| US10541141B2 | Method for selectively etching with reduced aspect ratio dependence | Electricity | 0 | Active |
| US8912633B2 | In-situ photoresist strip during plasma etching of active hard mask | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.