Robert D. Mailho
7Patents
7h-index
12Co-inventors
52Inventor score
Filing activity: Aug 7, 1996 → Apr 10, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5891251A | CVD reactor having heated process chamber within isolation chamber | Electricity | 374 | Expired |
| US6113984A | Gas injection system for CVD reactors | Chemistry; Metallurgy | 43 | Expired |
| US5653808A | Gas injection system for CVD reactors | Chemistry; Metallurgy | 38 | Expired |
| US6031211A | Zone heating system with feedback control | Chemistry; Metallurgy | 21 | Expired |
| US6436796B1 | Systems and methods for epitaxial processing of a semiconductor substrate | Chemistry; Metallurgy | 20 | Expired |
| US6902622B2 | Systems and methods for epitaxially depositing films on a semiconductor substrate | Electricity | 19 | Expired |
| US6118100A | Susceptor hold-down mechanism | Chemistry; Metallurgy | 16 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.