Ryan Pakulski
13Patents
3h-index
27Co-inventors
56Inventor score
Filing activity: Aug 17, 2004 → Mar 9, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7563068B2 | Low cost high throughput processing platform | Emerging Cross-Sectional Technologies | 13 | Active |
| US9184072B2 | Advanced multi-workpiece processing chamber | Emerging Cross-Sectional Technologies | 13 | Active |
| US7658586B2 | Advanced low cost high throughput processing platform | Emerging Cross-Sectional Technologies | 11 | Expired |
| US10580672B2 | Systems and methods for workpiece processing | Electricity | 3 | Active |
| US10790119B2 | Plasma processing apparatus with post plasma gas injection | Electricity | 2 | Active |
| US8668422B2 | Low cost high throughput processing platform | Emerging Cross-Sectional Technologies | 1 | Active |
| US11201036B2 | Plasma strip tool with uniformity control | Electricity | 1 | Active |
| US11348767B2 | Plasma processing apparatus having a focus ring adjustment assembly | Electricity | 1 | Active |
| US11257696B2 | Systems and methods for workpiece processing | Electricity | 0 | Active |
| US12362150B2 | Semiconductor chamber components with advanced coating techniques | Electricity | 0 | Active |
| US12002659B2 | Apparatus for generating etchants for remote plasma processes | Electricity | 0 | Active |
| US11508560B2 | Focus ring adjustment assembly of a system for processing workpieces under vacuum | Electricity | 0 | Active |
| US11515127B2 | End effectors for moving workpieces and replaceable parts within a system for processing workpieces under vacuum | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.