Samee Ur Rehman
9Patents
1h-index
33Co-inventors
40Inventor score
Filing activity: Jan 17, 2018 → May 27, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10310389B2 | Method of measuring, device manufacturing method, metrology apparatus, and lithographic system | Physics | 1 | Active |
| US11604419B2 | Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets | Physics | 0 | Active |
| US11754931B2 | Method for determining corrections for lithographic apparatus | Physics | 0 | Active |
| US10585354B2 | Method of optimizing a metrology process | Physics | 0 | Active |
| US12189305B2 | Metrology method and apparatus and computer program | Physics | 0 | Active |
| US10585048B2 | Method of determining a value of a parameter of interest of a target formed by a patterning process | Physics | 0 | Active |
| US11022897B2 | Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets | Physics | 0 | Active |
| US12032299B2 | Metrology method and associated metrology and lithographic apparatuses | Physics | 0 | Active |
| US10551172B2 | Metrology method, apparatus and computer program | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.