Stephen Roux
47Patents
9h-index
69Co-inventors
78Inventor score
Filing activity: Oct 31, 1996 → Jan 4, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5775569A | Method for building interconnect structures by injection molded solder and structures built | Electricity | 68 | Expired |
| US6332569A | Etched glass solder bump transfer for flip chip integrated circuit devices | Electricity | 55 | Expired |
| US6239863A | Removable cover for protecting a reticle, system including and method of using the same | Electricity | 50 | Expired |
| US6149122A | Method for building interconnect structures by injection molded solder and structures built | Electricity | 41 | Expired |
| US6105852A | Etched glass solder bump transfer for flip chip integrated circuit devices | Electricity | 35 | Expired |
| US6133633A | Method for building interconnect structures by injection molded solder and structures built | Electricity | 21 | Expired |
| US6778258B2 | Wafer handling system for use in lithography patterning | Electricity | 16 | Expired |
| US6906789B2 | Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion | Electricity | 14 | Expired |
| US7135693B2 | Method and apparatus for recycling gases used in a lithography tool | Physics | 10 | Expired |
| US6919573B2 | Method and apparatus for recycling gases used in a lithography tool | Physics | 8 | Expired |
| US6770895B2 | Method and apparatus for isolating light source gas from main chamber gas in a lithography tool | Physics | 8 | Expired |
| US6934005B2 | Reticle focus measurement method using multiple interferometric beams | Physics | 7 | Expired |
| US10558129B2 | Mask assembly | Physics | 6 | Active |
| US8553205B2 | Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus | Physics | 6 | Active |
| US7359037B2 | Drive for reticle-masking blade stage | Electricity | 5 | Expired |
| US7136151B2 | Reticle gripper barrier system for lithography use | Physics | 4 | Expired |
| US7105836B2 | Method and apparatus for cooling a reticle during lithographic exposure | Mechanical Engineering; Lighting; Heating | 4 | Expired |
| US7136214B2 | Active faceted mirror system for lithography | Physics | 3 | Expired |
| US7474384B2 | Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus | Physics | 3 | Active |
| US7372548B2 | Levitated reticle-masking blade stage | Electricity | 3 | Expired |
| US7119883B2 | Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light | Physics | 3 | Expired |
| US6950175B2 | System, method, and apparatus for a magnetically levitated and driven reticle-masking blade stage mechanism | Physics | 3 | Expired |
| US6894293B2 | System for recycling gases used in a lithography tool | Physics | 3 | Expired |
| US6984474B2 | Reticle barrier system for extreme ultra-violet lithography | Physics | 3 | Expired |
| US11500298B2 | Reticle sub-field thermal control | Physics | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.