Levitated reticle-masking blade stage
US7372548B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 6, 2005 |
| Grant date | May 13, 2008 |
| Priority date | — |
| Expiry date | Sep 6, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH02K2201/18
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.