Taide Tan
7Patents
3h-index
10Co-inventors
46Inventor score
Filing activity: Dec 14, 2016 → May 31, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10604841B2 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Electricity | 6 | Active |
| US11608559B2 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Electricity | 4 | Active |
| US11101164B2 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Electricity | 3 | Active |
| US11674226B2 | Separation of plasma suppression and wafer edge to improve edge film thickness uniformity | Electricity | 1 | Active |
| US12000047B2 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Electricity | 1 | Active |
| US12331402B2 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Electricity | 0 | Active |
| US11004662B2 | Temperature controlled spacer for use in a substrate processing chamber | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.