Thomas A. Kamp
3Patents
2h-index
8Co-inventors
30Inventor score
Filing activity: Mar 3, 2003 → Jan 25, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7098141B1 | Use of silicon containing gas for CD and profile feature enhancements of gate and shallow trench structures | Electricity | 3 | Expired |
| US7186661B2 | Method to improve profile control and N/P loading in dual doped gate applications | Electricity | 2 | Expired |
| US7682980B2 | Method to improve profile control and N/P loading in dual doped gate applications | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.