Tomoshi Inoue
9Patents
4h-index
10Co-inventors
50Inventor score
Filing activity: Mar 29, 2007 → Apr 17, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| USD634719S1 | Elastic membrane for semiconductor wafer polishing apparatus | General | 523 | Expired |
| US8485866B2 | Substrate holding apparatus, polishing apparatus, and polishing method | Performing Operations; Transporting | 6 | Active |
| US8357029B2 | Polishing apparatus | Performing Operations; Transporting | 5 | Active |
| US9308621B2 | Method and apparatus for polishing a substrate | Performing Operations; Transporting | 4 | Active |
| US8267746B2 | Substrate holding apparatus, polishing apparatus, and polishing method | Performing Operations; Transporting | 3 | Active |
| US7967665B2 | Substrate holding apparatus, polishing apparatus, and polishing method | Performing Operations; Transporting | 3 | Active |
| US8100739B2 | Substrate holding apparatus, polishing apparatus, and polishing method | Performing Operations; Transporting | 2 | Active |
| US10307882B2 | Method and apparatus for polishing a substrate | Performing Operations; Transporting | 1 | Active |
| US11548113B2 | Method and apparatus for polishing a substrate | Performing Operations; Transporting | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.